Brief

Anleggsmaskiner og utstyr

Ferdinand-Braun-Institut gGmbH, Leibniz-Institut für Höchstfrequenztechnik is planning the procurement of a high-performance maskless laser lithography system for high-resolution patterning of semiconductor wafers to support the development of advanced heterointegration technologies. The system must provide sub-micron precision combined with high throughput, support modern multi-beam laser writing technologies, and comply with ISO class 5 requirements for installation in a cleanroom environment. The estimated maximum total contract value is 510,000 EUR.

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Om anbudet

    The Ferdinand-Braun-Institut (FBH) plans to procure a high-performance maskless laser lithography system within the framework of the EU-funded APECS programme. The system will be used for high-resolution patterning of semiconductor wafers to support the development of advanced heterointegration technologies, including InP- and GaAs-based chiplets. It is intended to enable rapid prototyping as well as efficient processing of wafers with diameters up to 200 mm. The equipment must provide sub-micron precision combined with high throughput and support modern multi-beam laser writing technologies. It will be installed in a cleanroom environment and must comply with ISO class 5 requirements. The procurement procedure is planned for 2026.

    Kontakt navn
    Kerstin Tobis
    Kontakt telefon
    +493063928384
    Adresse
    Gustav-Kirchhoff-Straße 4, 12489 Berlin

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Se hele utlysningen

Tittel
Prior Information Notice – Maskless Laser Lithography System
Tilleggskoder

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Estimert verdi
510 000,00 €

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